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Proceedings Paper

Fabrication of three-dimensional metallodielectric photonic crystals by interference lithography
Author(s): P. N. Dyachenko; S. V. Karpeev; E. V. Fesik; Yu. V. Miklyaev; V. S. Pavelyev; G. D. Malchikov
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Paper Abstract

We report on the fabrication of metallodielectric photonic crystals by means of interference (or holographic) lithography and subsequent coating by gold nanoparticles. The grating is realized in a SU-8 photoresist using a He-Cd laser of wavelength 442 nm. The use of the wavelength found within the photoresist low absorption band enables fabricating structures that are uniform in depth. Parameters of the photoresist exposure and development for obtaining a porous structure corresponding to an orthorhombic lattice are determined. Coating of photonic crystals by gold nanoparticles is realized by reduction of chloroauric acid by a number of reductants in a water solution. This research shows that the combination of interference lithography and chemical coating by metal is attractive for the fabrication of metallodielectric photonic crystals.

Paper Details

Date Published: 14 May 2010
PDF: 6 pages
Proc. SPIE 7713, Photonic Crystal Materials and Devices IX, 77131J (14 May 2010); doi: 10.1117/12.853791
Show Author Affiliations
P. N. Dyachenko, Image Processing Systems Institute (Russian Federation)
Samara State Aerospace Univ. (Russian Federation)
S. V. Karpeev, Image Processing Systems Institute (Russian Federation)
Samara State Aerospace Univ. (Russian Federation)
E. V. Fesik, Samara State Aerospace Univ. (Russian Federation)
Yu. V. Miklyaev, South-Ural State Univ. (Russian Federation)
V. S. Pavelyev, Image Processing Systems Institute (Russian Federation)
Samara State Aerospace Univ. (Russian Federation)
G. D. Malchikov, Samara State Aerospace Univ. (Russian Federation)


Published in SPIE Proceedings Vol. 7713:
Photonic Crystal Materials and Devices IX
Hernán R. Míguez; Sergei G. Romanov; Lucio Claudio Andreani; Christian Seassal, Editor(s)

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