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Proceedings Paper

Characterization of the scattering effect of complex mask geometries with surface roughness
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Paper Abstract

We present a finite integration technique (FIT) simulator for modelling light diffraction from lithographic masks with complex shapes. This method has high flexibility in geometrical modelling and treating curved boundaries. The inherent feature of FIT allows more accurate electromagnetic field simulation in complex structures. This technique is also suited for fast EMF simulations and large 3D problems because of its parallelisation potential. We applied this method to investigate the effect of complex mask shapes on the printed image. We demonstrate results for a phase-shift mask (PSM) with footing extensions and surface roughness.

Paper Details

Date Published: 5 May 2010
PDF: 12 pages
Proc. SPIE 7717, Optical Modelling and Design, 771709 (5 May 2010); doi: 10.1117/12.853726
Show Author Affiliations
Z. Rahimi, Fraunhofer Institute for Integrated Systems and Device Technology (Germany)
Erlangen Graduate School in Advanced Optical Technologies (Germany)
A. Erdmann, Fraunhofer Institute for Integrated Systems and Device Technology (Germany)
Erlangen Graduate School in Advanced Optical Technologies (Germany)
C. Pflaum, Erlangen-Nuremberg Univ. (Germany)
Erlangen Graduate School in Advanced Optical Technologies (Germany)


Published in SPIE Proceedings Vol. 7717:
Optical Modelling and Design
Frank Wyrowski; John T. Sheridan; Jani Tervo; Youri Meuret, Editor(s)

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