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Proceedings Paper

Defect-related luminescence from nanostructured Si layers in the 1.5-1.6 μm wavelength region
Author(s): A. A. Shklyaev; A. B. Latyshev; M. Ichikawa
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Paper Abstract

Silicon with high concentrations of deep states is considered as a promising material for the fabrication of light emitters in the infrared region. We develop the method in which deep states appear in Si as a result of crystal defect formation during Si growth on the surfaces covered with dense arrays of Ge nanoscale islands. The concentration of dislocations in the grown Si layers reaches an order of 1011 cm-2 or higher. Such layers can be referred to as nanostructured Si (ns-Si). Light emitting diodes fabricated on the base of the ns-Si produce infrared emission in the wavelength region from about 1.4 to 1.7 μm at room temperature. To study the radiative and nonradiative recombination processes in the ns-Si, we measured the dependence of photoluminescence (PL) on the excitation power density at several temperatures. The model of the band structure and density of states is offered which involves only one type of radiative deep states that are responsible for the PL peak in the region from 1.5 to 1.6 μm. The observed dependences are explained as a result of competition between multiphonon and Auger recombinations of carriers along with their thermal generation.

Paper Details

Date Published: 26 February 2010
PDF: 11 pages
Proc. SPIE 7521, International Conference on Micro- and Nano-Electronics 2009, 75210C (26 February 2010); doi: 10.1117/12.853670
Show Author Affiliations
A. A. Shklyaev, Institute of Semiconductor Physics (Russian Federation)
Novosibirsk State Univ. (Russian Federation)
A. B. Latyshev, Institute of Semiconductor Physics (Russian Federation)
Novosibirsk State Univ. (Russian Federation)
M. Ichikawa, The Univ. of Tokyo (Japan)


Published in SPIE Proceedings Vol. 7521:
International Conference on Micro- and Nano-Electronics 2009
Kamil A. Valiev; Alexander A. Orlikovsky, Editor(s)

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