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Proceedings Paper

Performance of a combined chromatic confocal microscope with thin film reflectometer
Author(s): Florian Hirth; Thorbjörn C. Buck; Natasha Steinhausen; Alexander W. Koch
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Paper Abstract

Chromatic confocal microscopy is a common way to interrogate topologies and is well understood. Thin film reflectometry (TFR), on the other hand, is a way to monitor film thicknesses. Semiconductor and optics producing industries, e.g., require information about topological, film thickness or optical constants. We developed a spectrometric measuring system which is capable of determining high precision thin film thickness and topographic information of a specimen at the same time. The spectral intensity distribution reflected by a transparent thin film differs from a spectroscopic confocal observation by a chromatic measurement head, since the spectral interference fringes appear in the spectra. The spectrometer-based system interrogates both confocal, as well as thin film signals employing an analytical model of the chromatic shift of the measuring head, film composition and a least-square estimator. Hence, the advantage of this combined measuring system is the concurrent determination of film thickness and distance to the measuring head. By scanning the surface of a specimen laterally, a both tomo- and topological image can be acquired. Spacial measurements at test objects were carried out to demonstrate this measurement principle and the results are discussed.

Paper Details

Date Published: 3 June 2010
PDF: 8 pages
Proc. SPIE 7729, Scanning Microscopy 2010, 77291L (3 June 2010); doi: 10.1117/12.853517
Show Author Affiliations
Florian Hirth, Technische Univ. München (Germany)
Thorbjörn C. Buck, Technische Univ. München (Germany)
Natasha Steinhausen, Technische Univ. München (Germany)
Alexander W. Koch, Technische Univ. München (Germany)


Published in SPIE Proceedings Vol. 7729:
Scanning Microscopy 2010
Michael T. Postek; Dale E. Newbury; S. Frank Platek; David C. Joy, Editor(s)

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