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Proceedings Paper

Nanoprobe maskless lithography
Author(s): Ivo W. Rangelow; Tzvetan Ivanov; Yanko Sarov; Andreas Schuh; Andreas Frank; Hans Hartmann; Jens-Peter Zöllner; Dierdre L. Olynick; V. Kalchenko
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Paper Abstract

Scanning probe-based methods for surface modification and lithography are an emerging method of producing sub 20-nm features for nanoelectronic applications. In this study, we have demonstrated the nanoscale lithography based on patterning of 10 to 50-nm-thick calix[4]arene by electric-field-induced electrostatic scanning probe lithography. The features size control is obtained using electrostatic interactions and depends on the applied bias and speed of the AFM tip. The width of the obtained lines and dots varies from 10 to 60 nm depending on tip-sharpness, tip-substrate separation and tip-bias voltage.

Paper Details

Date Published: 2 April 2010
PDF: 10 pages
Proc. SPIE 7637, Alternative Lithographic Technologies II, 76370V (2 April 2010); doi: 10.1117/12.852265
Show Author Affiliations
Ivo W. Rangelow, Technische Univ. Ilmenau (Germany)
Tzvetan Ivanov, Technische Univ. Ilmenau (Germany)
Yanko Sarov, Technische Univ. Ilmenau (Germany)
Andreas Schuh, Technische Univ. Ilmenau (Germany)
Andreas Frank, Technische Univ. Ilmenau (Germany)
Hans Hartmann, Technische Univ. Ilmenau (Germany)
Jens-Peter Zöllner, Technische Univ. Ilmenau (Germany)
Dierdre L. Olynick, Lawrence Berkeley National Lab. (United States)
V. Kalchenko, Institute of Organic Chemistry (Ukraine)


Published in SPIE Proceedings Vol. 7637:
Alternative Lithographic Technologies II
Daniel J. C. Herr, Editor(s)

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