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Proceedings Paper

Dissolved gas quantification and bubble formation in liquid chemical dispense
Author(s): Glenn Tom; Wei Liu
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Paper Abstract

Gas dissolved in liquids such as photoresist comes out of solution as bubbles after the liquid experiences a pressure drop in a dispense train and may cause on-wafer defects. Reservoirs in the dispense train can assist in removing bubbles but are incapable of effectively removing dissolved gas. This study demonstrates the importance of maintaining the amount of dissolved gas in a liquid below a critical value to reduce bubbles generated after a pressure drop in the dispense train occurs. The methodology used to quantify dissolved gas during liquid dispense cycle using gas chromatography is discussed. The amount of dissolved gas is correlated to the amount of bubbles downstream of a pressure drop. This study also analyzes sources of bubbles in the dispense train and techniques to mediate the sources.

Paper Details

Date Published: 14 December 2009
PDF: 9 pages
Proc. SPIE 7520, Lithography Asia 2009, 752039 (14 December 2009); doi: 10.1117/12.852209
Show Author Affiliations
Glenn Tom, Advanced Technology Materials Inc. (United States)
Wei Liu, Advanced Technology Materials Inc. (United States)


Published in SPIE Proceedings Vol. 7520:
Lithography Asia 2009
Alek C. Chen; Woo-Sung Han; Burn J. Lin; Anthony Yen, Editor(s)

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