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Proceedings Paper

Photoluminescence properties of Nd-O+-codoped Si-based thin film
Author(s): Meiling Yuan; Chenfa Li; Xinli Leng; Qingnian Wang
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Paper Abstract

The photoluminescence(PL) spectra at room temperature for the Si-based samples doped by Nd, O+ by ion implantation are measured. The results show that all the samples possess blue-violet photoluminescence properties under the ultraviolet light excitation and its light emission is stable. The PL spectra has multiple peak structure. The results show the intensity of PL spectra is closely relative to Nd and O+ implantation and to the temperature of thermal annealing. The light emission is more greater for the sample of fisrt O+ then Nd ion-implanted silicon than the one of first Nd then O+ ion-implanted silicon. The light-emitiing mechanism is also analyzed.

Paper Details

Date Published: 3 December 2009
PDF: 6 pages
Proc. SPIE 7631, Optoelectronic Materials and Devices IV, 76312G (3 December 2009); doi: 10.1117/12.851422
Show Author Affiliations
Meiling Yuan, Nanchang Univ. (China)
Chenfa Li, Nanchang Univ. (China)
Xinli Leng, Nanchang Univ. (China)
Qingnian Wang, Nanchang Univ. (China)


Published in SPIE Proceedings Vol. 7631:
Optoelectronic Materials and Devices IV
Jian-Jun He; Guang-Hua Duan; Fumio Koyama; Ming C. Wu, Editor(s)

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