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Proceedings Paper

Fabrication of a new BEAMETR chip for automatic electron beam size measurement
Author(s): S. Babin; K. Bay; S. Cabrini; S. Dhuey; B. Harteneck; M. Machin; C. Peroz
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Paper Abstract

BEAMETR (BEAm METRology) technique is demonstrated as an attractive solution for automatic measurement of electron beam sizes in two coordinates. The method associates one software and one specially designed pattern chip. The fabrication of new BEAMETR design is performed by electron beam lithography and metal lift-off. A specific bi-layer resist system and proximity correction is used for achieving the requirements for the "pound-key" shape of BEAMETR pattern. Beam sizes in two coordinates (x,y) of Scanning Electron Microscope are measured for various operating conditions. This method allows measuring electron beam sizes down to 2 nanometers.

Paper Details

Date Published: 1 April 2010
PDF: 5 pages
Proc. SPIE 7638, Metrology, Inspection, and Process Control for Microlithography XXIV, 76383N (1 April 2010); doi: 10.1117/12.850967
Show Author Affiliations
S. Babin, aBeam Technologies (United States)
K. Bay, aBeam Technologies (United States)
S. Cabrini, Lawrence Berkeley National Lab. (United States)
S. Dhuey, Lawrence Berkeley National Lab. (United States)
B. Harteneck, Lawrence Berkeley National Lab. (United States)
M. Machin, aBeam Technologies (United States)
C. Peroz, aBeam Technologies (United States)

Published in SPIE Proceedings Vol. 7638:
Metrology, Inspection, and Process Control for Microlithography XXIV
Christopher J. Raymond, Editor(s)

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