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Proceedings Paper

Fabrication of wavelength selective germanium dielectric supported microbolometers
Author(s): Jong Yeon Park; Joo-Yun Jung; Dean P. Neikirk; Aniruddha S. Weling; William T. Hafer; James H. Goldie; Paul Wilson
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Paper Abstract

This paper describes the microfabrication process and characterization of wavelength selective germanium dielectric supported microbolometers, which should be compatible with standard microbolometer fabrication processes. Here we have demonstrated a micro fabricated robust germanium dielectric structure layer that replaces the usual silicon nitride structural layer in microbolometers. The fabricated microbolometers consist of a chromium resistive sheet as an absorber layer above an air-gap/germanium dielectric structure.

Paper Details

Date Published: 3 May 2010
PDF: 7 pages
Proc. SPIE 7660, Infrared Technology and Applications XXXVI, 76601C (3 May 2010); doi: 10.1117/12.850456
Show Author Affiliations
Jong Yeon Park, The Univ. of Texas at Austin (United States)
Joo-Yun Jung, The Univ. of Texas at Austin (United States)
Dean P. Neikirk, The Univ. of Texas at Austin (United States)
Aniruddha S. Weling, Foster-Miller, Inc. (United States)
William T. Hafer, Infoscitex Corp. (United States)
James H. Goldie, Infoscitex Corp. (United States)
Paul Wilson, U.S. Army RDECOM-ARDEC (United States)


Published in SPIE Proceedings Vol. 7660:
Infrared Technology and Applications XXXVI
Bjørn F. Andresen; Gabor F. Fulop; Paul R. Norton, Editor(s)

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