Share Email Print
cover

Proceedings Paper

Enhanced field ionization/desorption on branched silicon nanowires: applications in gas ionization detection
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

We demonstrate anomalous gaseous field ionization and field desorption on branching intrinsic silicon nanowires grown by a two-step VLS technique. Field ionization and desorption I-V curves of argon, nitrogen, helium, and ammonia, were recorded individually within a wide pressure range (10-7 to 10 Torr). Field ionization initiated at sub volt was followed by field desorption at about 7 - 38 V (applied field of ~ 7×102 to 3.8×103 V/cm). Such voltages are three orders of magnitude smaller than the applied voltages required to generate field ionization on sharp metallic tips having the same tip curvature. The measured I-V curves were pressure dependent. Low voltage filed ionization and desorption phenomena were attributed to the combination effects of geometrical field enhancement on the apex of nanoscale silicon branches, field penetration, increased tunneling critical distance, band gap widening due to quantum confinement, and the surface states formed by the catalyst. The results presented herein suggest that gold terminated branching silicon nanowires could be strong candidates in building low power gas ionization sensors useful in highly selective detection of gases with low adsorption energies.

Paper Details

Date Published: 5 May 2010
PDF: 8 pages
Proc. SPIE 7679, Micro- and Nanotechnology Sensors, Systems, and Applications II, 76791D (5 May 2010); doi: 10.1117/12.850281
Show Author Affiliations
R. Banan-Sadeghian, Univ. of California, Davis (United States)
M. Saif Islam, Univ. of California, Davis (United States)


Published in SPIE Proceedings Vol. 7679:
Micro- and Nanotechnology Sensors, Systems, and Applications II
Thomas George; M. Saif Islam; Achyut Kumar Dutta, Editor(s)

© SPIE. Terms of Use
Back to Top