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Proceedings Paper

VPD PbSe technology: the road toward the industrial maturity
Author(s): Rodrigo Linares Herrero; M. Teresa Montojo Supervielle; Arturo Baldasano Ramírez
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Paper Abstract

During the last 15 years, the Spanish MoD laboratories (CIDA) have developed the VPD PbSe technology (Vapor Phase Deposited). The excellent properties of the material (sensitivity in the MWIR band, high performance in uncooled operation, and photodetector), together with a new method of processing the material based on PbSe deposition by phase vapor, which is fully compatible with Si-CMOS technology, have opened tremendous perspectives with multiple applications for the detector where fast responses and low cost are main requirements. In 2008 the VPD manufacturing technology was transferred to New Infrared Technologies, S.L. (NIT) This paper shows the actual situation of the technology, describing the last advances reached with the new 32x32 uncooled imager, able to provide frame rates above 1,000 fps. The work also describes the industrial strategy adopted for bringing the technology towards the industrialization and the roadmap of the technology from the point of view of future devices and systems.

Paper Details

Date Published: 3 May 2010
PDF: 8 pages
Proc. SPIE 7660, Infrared Technology and Applications XXXVI, 766034 (3 May 2010); doi: 10.1117/12.850174
Show Author Affiliations
Rodrigo Linares Herrero, New Infrared Technologies, Ltd. (Spain)
M. Teresa Montojo Supervielle, New Infrared Technologies, Ltd. (Spain)
Arturo Baldasano Ramírez, New Infrared Technologies, Ltd. (Spain)

Published in SPIE Proceedings Vol. 7660:
Infrared Technology and Applications XXXVI
Bjørn F. Andresen; Gabor F. Fulop; Paul R. Norton, Editor(s)

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