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Proceedings Paper

Improvement in process window aware OPC
Author(s): Xiaohai Li; Yasushi Kojima; Hironobu Taoka; Akemi Moniwa; Matt St. John; Yang Ping; Randall Brown; Robert Lugg; Sooryong Lee
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Paper Abstract

In this paper, we present some important improvements on our process window aware OPC (PWA-OPC). First, a CDbased process window checking is developed to find all pinching and bridging errors; Secondly, a rank ordering method is constructed to do process window correction; Finally, PWA-OPC can be applied to selected areas with different specifications for different feature types. In addition, the improved PWA-OPC recipe is constructed as sequence of independent modules, so it is easy for users to modify its algorithm and build original IPs.

Paper Details

Date Published: 3 March 2010
PDF: 8 pages
Proc. SPIE 7640, Optical Microlithography XXIII, 76402O (3 March 2010); doi: 10.1117/12.849904
Show Author Affiliations
Xiaohai Li, Synopsys Inc. (United States)
Yasushi Kojima, Renesas Technology Co. (Japan)
Hironobu Taoka, Renesas Technology Co. (Japan)
Akemi Moniwa, Renesas Technology Co. (Japan)
Matt St. John, Synopsys Inc. (United States)
Yang Ping, Synopsys Inc. (United States)
Randall Brown, Synopsys Inc. (United States)
Robert Lugg, Synopsys Inc. (United States)
Sooryong Lee, Synopsys Inc. (United States)

Published in SPIE Proceedings Vol. 7640:
Optical Microlithography XXIII
Mircea V. Dusa; Will Conley, Editor(s)

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