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Proceedings Paper

CMOS-compatible LVOF-based visible microspectrometer
Author(s): Arvin Emadi; Huaiwen Wu; Ger de Graaf; Reinoud F. Wolffenbuttel
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Paper Abstract

This paper reports on a CMOS-Compatible Linear Variable Optical Filter (LVOF) visible micro-spectrometer. The CMOS-compatible post process for fabrication of the LVOF has been used for integration of the LVOF with a CMOS chip containing a 128-element photodiode array and readout circuitry. Fabrication of LVOF involves a process for fabrication of very small taper angles, ranging from 0.001° to 0.1°, in SiO2. These layers can be fabricated flexibly in a resist layer by just one lithography step and a subsequent reflow process. The 3D pattern of the resist structures is subsequently transferred into SiO2 by appropriate etching. Complete LVOF fabrication involves CMOS-compatible deposition of a lower dielectric mirror using a stack of dielectrics on the wafer, tapered layer formation and deposition of the top dielectric mirror. The LVOF has been optimized for 580 nm - 720 nm spectral operating range and has also been mounted on a CCD camera for characterization. The design of LVOF micro-spectrometer, the fabrication and characterization results are presented.

Paper Details

Date Published: 27 April 2010
PDF: 8 pages
Proc. SPIE 7680, Next-Generation Spectroscopic Technologies III, 76800W (27 April 2010); doi: 10.1117/12.849844
Show Author Affiliations
Arvin Emadi, Delft Univ. of Technology (Netherlands)
Huaiwen Wu, Delft Univ. of Technology (Netherlands)
Ger de Graaf, Delft Univ. of Technology (Netherlands)
Reinoud F. Wolffenbuttel, Delft Univ. of Technology (Netherlands)

Published in SPIE Proceedings Vol. 7680:
Next-Generation Spectroscopic Technologies III
Mark A. Druy; Christopher D. Brown; Richard A. Crocombe, Editor(s)

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