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Proceedings Paper

High reliability ArF light source for double patterning immersion lithography
Author(s): Rostislav Rokitski; Toshi Ishihara; Rajeskar Rao; Rui Jiang; Mary Haviland; Theodore Cacouris; Daniel Brown
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Paper Abstract

Double patterning lithography places significant demands not only on the optical performance of the light source (higher power, improved parametric stability), but also on high uptime in order to meet the higher throughput requirements of the litho cell. In this paper, we will describe the challenges faced in delivering improved performance while achieving better reliability and resultant uptime as embodied in the XLR 600ix light source from Cymer, announced one year ago. Data from extended life testing at 90W operation will be shown to illustrate these improvements.

Paper Details

Date Published: 4 March 2010
PDF: 7 pages
Proc. SPIE 7640, Optical Microlithography XXIII, 76401Q (4 March 2010); doi: 10.1117/12.849065
Show Author Affiliations
Rostislav Rokitski, Cymer, Inc. (United States)
Toshi Ishihara, Cymer, Inc. (United States)
Rajeskar Rao, Cymer, Inc. (United States)
Rui Jiang, Cymer, Inc. (United States)
Mary Haviland, Cymer, Inc. (United States)
Theodore Cacouris, Cymer, Inc. (United States)
Daniel Brown, Cymer, Inc. (United States)


Published in SPIE Proceedings Vol. 7640:
Optical Microlithography XXIII
Mircea V. Dusa; Will Conley, Editor(s)

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