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Proceedings Paper

Optimization on illumination source with design of experiments
Author(s): Helen Hu; Yi Zou; Yunfei Deng
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Paper Abstract

In advanced photolithography process for manufacturing integrated circuits, the critical pattern sizes that need to be printed on wafer are much smaller than the wavelength. Thus, source optimization (SO) techniques play a critical role in enabling a successful technology node. However, finding an appropriate illumination configuration involves intensive computation simulations. EDA vendors have been developing the pixelated source optimization tools that co-optimize both source and mask for a set of patterns. As an alternative approach, we have introduced design of experiments (DOE) methodology for parameterized source optimization to minimize computation efforts while achieving comparable CDU control for given design patterns. In this paper, we present a Response Surface Methodology (RSM) that simplifies the response function and achieves the optimization goal on multiple responses. Results have shown that the optimal input settings identified by this approach are comparable with the pixelated source optimization results.

Paper Details

Date Published: 10 March 2010
PDF: 9 pages
Proc. SPIE 7640, Optical Microlithography XXIII, 764027 (10 March 2010); doi: 10.1117/12.848876
Show Author Affiliations
Helen Hu, GLOBALFOUNDRIES Inc. (United States)
Yi Zou, GLOBALFOUNDRIES Inc. (United States)
Yunfei Deng, GLOBALFOUNDRIES Inc. (United States)


Published in SPIE Proceedings Vol. 7640:
Optical Microlithography XXIII
Mircea V. Dusa; Will Conley, Editor(s)

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