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Proceedings Paper

CD-SEM utility with double patterning
Author(s): Benjamin Bunday; Pete Lipscomb; Shunsuke Koshihara; Shigeki Sukegawa; Yasuo Kawai; Yuki Ojima; Andy Self; Lorena Page
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Paper Abstract

Requirements for increasingly integrated metrology solutions continue to drive applications that incorporate process characterization tools, as well as the ability to improve metrology production capability and cycle time, with a single application. All of the most critical device layers today, and even non-critical layers, now require optical proximity correction (OPC), which must be rigorously modeled and calibrated as part of process development and extensively verified once new product reticles are released using critical dimension-scanning electron microscopy (CD-SEM) tools. Automatic setup of complex recipes is one of the major trends in CD-SEM applications, which is adding much value to CD-SEM metrology. In addition, as integrated circuit dimensions and pitches continue to shrink, double patterning (DP) has become more common. Thus automatic recipe setup has needed to incorporate capabilities to deal simultaneously with two layers. This has the benefit of allowing the user to measure the two different CD populations and the image shift in the lithography (i.e., the overlay). Thus automatic recipe creation can be used to characterize the DP pattern for both CD and overlay. DesignGauge, the automatic recipe utility for Hitachi CG series CD-SEMs, is not only capable of offline recipe creation, but also can also directly transfer design-based recipes into standard CD-SEM recipes for use with DP processes. These recipes can be used for OPC model-building and verification as with previous DesignGauge applications. The software also provides design template-based recipe setup for production layer recipes, which improves production tool utilization, as production recipes can thus be written offline for new products, improving first silicon cycle time, engineering time to generate recipes, and CD-SEM utilization. Another benefit of the application is that recipes are more robust than with conventional direct image-based pattern recognition. This paper explores the feasibility of matching a two-layer GDS pattern to features in an image, allowing for the more complex measurements involved in DP characterization. This work will evaluate DesignGauge with double litho double etch (DLDE DP), including rigorous tests of navigation, pattern recognition success rates, SEM image placement, throughput of the recipe creation, recipe execution, and verification of proper measurements of the dual CD populations and overlay.

Paper Details

Date Published: 1 April 2010
PDF: 12 pages
Proc. SPIE 7638, Metrology, Inspection, and Process Control for Microlithography XXIV, 76382U (1 April 2010); doi: 10.1117/12.848546
Show Author Affiliations
Benjamin Bunday, International SEMATECH Manufacturing Initiative (United States)
Pete Lipscomb, International SEMATECH Manufacturing Initiative (United States)
Shunsuke Koshihara, Hitachi High-Technologies Corp. (Japan)
Shigeki Sukegawa, Hitachi High-Technologies Corp. (Japan)
Yasuo Kawai, Hitachi High-Technologies Corp. (Japan)
Yuki Ojima, Hitachi High-Technologies Corp. (Japan)
Andy Self, Hitachi High-Technologies America, Inc. (United States)
Lorena Page, Hitachi High-Technologies America, Inc. (United States)


Published in SPIE Proceedings Vol. 7638:
Metrology, Inspection, and Process Control for Microlithography XXIV
Christopher J. Raymond, Editor(s)

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