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Proceedings Paper

Scatterometry characterization of spacer double patterning structures
Author(s): Prasad Dasari; Jiangtao Hu; Zhuan Liu; Asher Tan; Oleg Kritsun; Catherine Volkman; Chris Bencher
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Paper Abstract

DPT overlay errors result in CD distortions and CD non-uniformity leads to overlay errors demanding increased critical dimension uniformity (CDU) and improved overlay control. Scatterometry techniques are used to characterize the CD uniformity, focus and dose control. We will present CD distribution (CDU) and profile characterization for spacer double patterning structures by advanced scatterometry methods. Our result will include NISR, and spectroscopic ellipsometry (SE) characterization of CDU sensitivity in spacer double patterning stack. We will further show the results of spacer DP structures by NISR and SE measurements. Metrology comparison at various process steps including litho, etch and spacer and validation of CDU and profile; all benchmarked against traditional CDSEM measurements.

Paper Details

Date Published: 1 April 2010
PDF: 12 pages
Proc. SPIE 7638, Metrology, Inspection, and Process Control for Microlithography XXIV, 76381J (1 April 2010); doi: 10.1117/12.848518
Show Author Affiliations
Prasad Dasari, Nanometrics Inc. (United States)
Jiangtao Hu, Nanometrics Inc. (United States)
Zhuan Liu, Nanometrics Inc. (United States)
Asher Tan, Nanometrics Inc. (United States)
Oleg Kritsun, GLOBALFOUNDRIES Inc. (United States)
Catherine Volkman, GLOBALFOUNDRIES Inc. (United States)
Chris Bencher, Applied Materials, Inc. (United States)


Published in SPIE Proceedings Vol. 7638:
Metrology, Inspection, and Process Control for Microlithography XXIV
Christopher J. Raymond, Editor(s)

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