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Proceedings Paper

Nano-silicon based photonic crystal stamps with electron beam lithography (EBL) technology
Author(s): Reyhaneh Jannesari; Iris Bergmair; Saeid Zamiri; Kurt Hingerl
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Paper Abstract

We report on using e-beam lithographically technology for enabling the mass replication of custom-designed and prepared Nano-structures via establishing nanoimprint processes for pattern transfer into UV curable prepolymes. By EBL, the new nano-fabrication technology based on the concept of disposal master technology (DMT) is suitable for mass volume manufacturing of large area arrays of sub-wavelength photonic elements. We will present some kinds of PhC and waveguides for fabrication of nanoimprint Electron beam lithography stamps.

Paper Details

Date Published: 9 April 2010
PDF: 8 pages
Proc. SPIE 7643, Active and Passive Smart Structures and Integrated Systems 2010, 76431X (9 April 2010); doi: 10.1117/12.848497
Show Author Affiliations
Reyhaneh Jannesari, Univ. Linz (Austria)
Iris Bergmair, Univ. Linz (Austria)
Saeid Zamiri, Univ. Linz (Austria)
Kurt Hingerl, Univ. Linz (Austria)

Published in SPIE Proceedings Vol. 7643:
Active and Passive Smart Structures and Integrated Systems 2010
Mehrdad N. Ghasemi-Nejhad, Editor(s)

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