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Proceedings Paper

High brightness EUV light sources for actinic metrology
Author(s): Peter Choi; Sergey V. Zakharov; Raul Aliaga-Rossel; Aldrice Bakouboula; Jeremy Bastide; Otman Benali; Philippe Bove; Michèle Cau; Grainne Duffy; Wafa Kezzar; Blair Lebert; Keith Powell; Ouassima Sarroukh; Luc Tantart; Edmund Wyndham; Clement Zaepffel; Vasily S. Zakharov
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Paper Abstract

EUV sources for actinic mask metrology, particularly for defect inspection, require extremely high brightness. The selfabsorption of radiation limits the in-band EUV radiance of the source plasma and makes it difficult to attain the necessary brightness and power from a conventional single unit EUV source. One possible solution is through multiplexing of multiple low etendue sources. NANO-UV is delivering a new generation of EUV light source with an intrinsic photon collector, the i-SoCoMo™ concept, where a micro plasma pulsed discharge source is integrated to a photon collector based on an in situ active plasma structure. The source is characterized by high brightness, low etendue and very high irradiance, at moderate output power, without the use of external physical optics. Such a source could form the basic building block, through multiplexing of several units, to satisfy the very high brightness and moderate power requirement of the EUV sources required for actinic mask metrology. Based upon this multiplexing concept, a family of specially configured multiplexed source structures, the HYDRA™ design, is being introduced to address the mask metrology needs.

Paper Details

Date Published: 22 March 2010
PDF: 11 pages
Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 76363B (22 March 2010); doi: 10.1117/12.848477
Show Author Affiliations
Peter Choi, NANO-UV SAS (France)
EPPRA SAS (France)
Sergey V. Zakharov, NANO-UV SAS (France)
EPPRA SAS (France)
Kurchatov Institute (Russian Federation)
Raul Aliaga-Rossel, NANO-UV SAS (France)
Aldrice Bakouboula, NANO-UV SAS (France)
Jeremy Bastide, EPPRA SAS (France)
Otman Benali, NANO-UV SAS (France)
EPPRA SAS (France)
Philippe Bove, NANO-UV SAS (France)
Michèle Cau, NANO-UV SAS (France)
Grainne Duffy, NANO-UV SAS (France)
Wafa Kezzar, NANO-UV SAS (France)
Blair Lebert, EPPRA SAS (France)
Keith Powell, NANO-UV SAS (France)
Ouassima Sarroukh, EPPRA SAS (France)
Luc Tantart, NANO-UV SAS (France)
Edmund Wyndham, Pontificia Univ. Católica de Chile (Chile)
Clement Zaepffel, EPPRA SAS (France)
Vasily S. Zakharov, EPPRA SAS (France)

Published in SPIE Proceedings Vol. 7636:
Extreme Ultraviolet (EUV) Lithography
Bruno M. La Fontaine, Editor(s)

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