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Proceedings Paper

Advances in DMD-based UV application reliability below 320nm
Author(s): Jonathan T. Fong; Tom W. Winter; S. Josh Jacobs
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Paper Abstract

Texas Instrument's spatial light modulator chip, the DMD (digital micromirror device, the central chip in all DLP based systems) has been used in multiple maskless lithography applications for the past 5-7 years. Typically these applications have been focused on PCB lithography. Applications using illumination below 320nm have not been feasible due to shortened lifetime of the device at shorter wavelengths. Recent advances in DMD processing have made significant improvements in the operational lifetime of the DMD. This paper will cover the background of UV-A DMD maskless lithography and demonstrate the increased lifetime at 311nm and 266nm with the new processes.

Paper Details

Date Published: 1 April 2010
PDF: 6 pages
Proc. SPIE 7637, Alternative Lithographic Technologies II, 763718 (1 April 2010); doi: 10.1117/12.848461
Show Author Affiliations
Jonathan T. Fong, Texas Instruments Inc. (United States)
Tom W. Winter, Texas Instruments Inc. (United States)
S. Josh Jacobs, Texas Instruments Inc. (United States)


Published in SPIE Proceedings Vol. 7637:
Alternative Lithographic Technologies II
Daniel J. C. Herr, Editor(s)

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