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Proceedings Paper

Immersion BARC for hyper NA applications II
Author(s): Yu-Chin Huang; Kai-Lin Chuang; Tsung-Ju Yeh; Steven Wu; Bill Lin; Wen-Liang Huang; Bo-Jou Lu; E. T. Liu; Chun Chi Yu; Chaoyang Lin; Jeong Yun Yu; Greg Prokopowicz; Sue Ryeon Kim; Sabrina Wong; George Barclay
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Paper Abstract

Reflectivity control through angle is challenging at hyper NA, especially for Logic devices which have various pitches in the same layer. A multilayer antireflectant system is required to control complex reflectivity resulting from various incident angles. In our previous works, we showed the successful optimization of multilayer antireflectant systems at hyper NA for BEOL layers. In this paper, we show the optimization of new multilayer bottom anti-reflectant systems to meet new process requirements at 28nm node Logic device. During the manufacturing process, rework process is necessary when critical dimension or overlay doesn't meet the specifications. Some substrates are sensitive to the rework process. As a result, litho performance including the line width roughness (LWR) could change. The optimizations have been done on various stack options to improve LWR. An immersion tool at 1.35NA was used to perform lithography tests. Simulation was performed using ProlithTM software.

Paper Details

Date Published: 3 March 2010
PDF: 8 pages
Proc. SPIE 7640, Optical Microlithography XXIII, 76403F (3 March 2010); doi: 10.1117/12.848454
Show Author Affiliations
Yu-Chin Huang, United Microelectronics Corp. (Taiwan)
Kai-Lin Chuang, United Microelectronics Corp. (Taiwan)
Tsung-Ju Yeh, United Microelectronics Corp. (Taiwan)
Steven Wu, United Microelectronics Corp. (Taiwan)
Bill Lin, United Microelectronics Corp. (Taiwan)
Wen-Liang Huang, United Microelectronics Corp. (Taiwan)
Bo-Jou Lu, United Microelectronics Corp. (Taiwan)
E. T. Liu, United Microelectronics Corp. (Taiwan)
Chun Chi Yu, United Microelectronics Corp. (Taiwan)
Chaoyang Lin, The Dow Chemical Co. (United States)
Jeong Yun Yu, The Dow Chemical Co. (United States)
Greg Prokopowicz, The Dow Chemical Co. (United States)
Sue Ryeon Kim, The Dow Chemical Co. (United States)
Sabrina Wong, The Dow Chemical Co. (United States)
George Barclay, The Dow Chemical Co. (United States)

Published in SPIE Proceedings Vol. 7640:
Optical Microlithography XXIII
Mircea V. Dusa; Will Conley, Editor(s)

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