Share Email Print
cover

Proceedings Paper

Lithography cycle time improvements using short-interval scheduling
Author(s): David Norman; Scott Watson; Michael Anderson; Steve Marteney; Ben Mehr
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Partially and fully automated semiconductor manufacturing facilities around the world have employed automated real-time dispatchers (RTD) as a critical element of their factory management solutions. The success of RTD is attributable to a detailed and extremely accurate data base that reflects the current state of the factory, consistently applied dispatching policies and continuous improvement of these dispatching policies. However, many manufactures are now reaching the benefit limits of pure dispatching-based or other "heuristic-only" solutions. A new solution is needed that combines locally optimized short-interval schedules with RTD policies to target further reductions in product cycle time. This paper describes an integrated solution that employs four key components: 1. real-time data generation, 2. simulation-based prediction, 3. locally optimized short-interval scheduling, and 4. schedule-aware real-time dispatching. The authors describe how this solution was deployed in lithography and wet / diffusion areas, and report the resulting improvements measured.

Paper Details

Date Published: 12 March 2010
PDF: 9 pages
Proc. SPIE 7640, Optical Microlithography XXIII, 76403B (12 March 2010); doi: 10.1117/12.848442
Show Author Affiliations
David Norman, Applied Materials, Inc. (United States)
Scott Watson, Applied Materials, Inc. (United States)
Michael Anderson, Applied Materials, Inc. (United States)
Steve Marteney, Applied Materials, Inc. (United States)
Ben Mehr, Applied Materials, Inc. (United States)


Published in SPIE Proceedings Vol. 7640:
Optical Microlithography XXIII
Mircea V. Dusa; Will Conley, Editor(s)

© SPIE. Terms of Use
Back to Top