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Proceedings Paper

CDU linear model based on aerial image principal components
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Paper Abstract

In this paper, we present an image quality model and a process window model that is linear or quadratic with respect to common pupil space errors. Similar to other CDU models in its simplicity, our model expands linear representation to comprehensive image quality specs in a large focus-dose grid. With this model we identify corrections to the full Bossung curve or process window shapes that are proportional to aberration levels.

Paper Details

Date Published: 10 March 2010
PDF: 9 pages
Proc. SPIE 7640, Optical Microlithography XXIII, 764035 (10 March 2010); doi: 10.1117/12.848429
Show Author Affiliations
Zhiyong Yang, Shanghai Micro Electronics Equipment Co., Ltd. (China)
Anatoly Y. Burov, Shanghai Micro Electronics Equipment Co., Ltd. (China)
Liang Li, Shanghai Micro Electronics Equipment Co., Ltd. (China)
Fan Wang, Shanghai Micro Electronics Equipment Co., Ltd. (China)
Zhaoxiang Chu, Shanghai Micro Electronics Equipment Co., Ltd. (China)


Published in SPIE Proceedings Vol. 7640:
Optical Microlithography XXIII
Mircea V. Dusa; Will Conley, Editor(s)

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