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Proceedings Paper

Field-based simulations of directed self-assembly in a mixed brush system
Author(s): Su-Mi Hur; Amalie L. Frischknecht; Dale L. Huber; Glenn H. Fredrickson
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Paper Abstract

Self-assembling block copolymer thin films have attracted considerable attention as a promising high resolution lithographic tool due to the 10 nm scale of microdomain ordering and their facility for modulation of size and pattern. However, for block copolymer lithography to be a viable solution for advanced nano-lithographic technologies, several critical requirements need to be satisfied. Our research has focused on developing complementary mixed polymer brush lithography tools satisfying the required criteria, by means of Self-Consistent Field Theory (SCFT) simulations. Specifically, we have concentrated on graphoepitaxial techniques that are widely tested and considered a particularly promising method for controlling the microdomain ordering.

Paper Details

Date Published: 1 April 2010
PDF: 5 pages
Proc. SPIE 7637, Alternative Lithographic Technologies II, 76370P (1 April 2010); doi: 10.1117/12.848416
Show Author Affiliations
Su-Mi Hur, Univ. of California, Santa Barbara (United States)
Amalie L. Frischknecht, Sandia National Labs. (United States)
Dale L. Huber, Sandia National Labs. (United States)
Glenn H. Fredrickson, Univ. of California, Santa Barbara (United States)


Published in SPIE Proceedings Vol. 7637:
Alternative Lithographic Technologies II
Daniel J. C. Herr, Editor(s)

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