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Proceedings Paper

Laser-produced plasma light source for EUVL
Author(s): Igor V. Fomenkov; Alex I. Ershov; William N. Partlo; David W. Myers; Richard L. Sandstrom; Norbert R. Böwering; Georgiy O. Vaschenko; Oleh V. Khodykin; Alexander N. Bykanov; Shailendra N. Srivastava; Imtiaz Ahmad; Chirag Rajyaguru; Daniel J. Golich; Silvia De Dea; Richard R. Hou; Kevin M. O'Brien; Wayne J. Dunstan; David C. Brandt
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Paper Abstract

This paper describes the development of laser-produced-plasma (LPP) extreme-ultraviolet (EUV) source architecture for advanced lithography applications in high volume manufacturing. EUV lithography is expected to succeed 193nm immersion technology for sub-22nm critical layer patterning. In this paper we discuss the most recent results from high EUV power testing and debris mitigation testing on witness samples and normal incidence collectors. Subsystem performance will be shown including the CO2 drive laser, debris mitigation, normal incidence collector and coatings, droplet generation, laser-to-droplet targeting control, intermediate-focus (IF) metrology and system use and experience. In addition, a number of smaller lab-scale experimental systems have also been constructed and tested. This presentation reviews the experimental results obtained on systems with a focus on the topics most critical for an HVM source.

Paper Details

Date Published: 22 March 2010
PDF: 6 pages
Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 763639 (22 March 2010); doi: 10.1117/12.848408
Show Author Affiliations
Igor V. Fomenkov, Cymer, Inc. (United States)
Alex I. Ershov, Cymer, Inc. (United States)
William N. Partlo, Cymer, Inc. (United States)
David W. Myers, Cymer, Inc. (United States)
Richard L. Sandstrom, Cymer, Inc. (United States)
Norbert R. Böwering, Cymer, Inc. (United States)
Georgiy O. Vaschenko, Cymer, Inc. (United States)
Oleh V. Khodykin, Cymer, Inc. (United States)
Alexander N. Bykanov, Cymer, Inc. (United States)
Shailendra N. Srivastava, Cymer, Inc. (United States)
Imtiaz Ahmad, Cymer, Inc. (United States)
Chirag Rajyaguru, Cymer, Inc. (United States)
Daniel J. Golich, Cymer, Inc. (United States)
Silvia De Dea, Cymer, Inc. (United States)
Richard R. Hou, Cymer, Inc. (United States)
Kevin M. O'Brien, Cymer, Inc. (United States)
Wayne J. Dunstan, Cymer, Inc. (United States)
David C. Brandt, Cymer, Inc. (United States)

Published in SPIE Proceedings Vol. 7636:
Extreme Ultraviolet (EUV) Lithography
Bruno M. La Fontaine, Editor(s)

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