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Proceedings Paper

Automating molecular transfer lithography at 25nm on 200mm wafers including site-remote coating of resist on dissolvable templates
Author(s): Charles D. Schaper
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Paper Abstract

Targeting applications that require resolution of around 25nm on substrates to 200mm, automated equipment is described that performs the molecular transfer lithography process in which water-soluble templates of polyvinyl alcohol, replicated from master topography on silicon, are coated with resist and bonded onto substrates. Moreover, to eliminate the need for handling wet resist, dry bondable epoxy-based resist is demonstrated, which is pre-coated on the templates and shipped to the fabrication facility where the automation equipment is housed thereby improving ease-of-use, efficiency and throughput, while lowering costs.

Paper Details

Date Published: 2 April 2010
PDF: 9 pages
Proc. SPIE 7637, Alternative Lithographic Technologies II, 76370U (2 April 2010); doi: 10.1117/12.848402
Show Author Affiliations
Charles D. Schaper, Transfer Devices, Inc. (United States)

Published in SPIE Proceedings Vol. 7637:
Alternative Lithographic Technologies II
Daniel J. C. Herr, Editor(s)

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