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Proceedings Paper

Flying plasmonic lens at near field for high speed nanolithography
Author(s): Liang Pan; Yong-Shik Park; Yi Xiong; Erick Ulin-Avila; Li Zeng; Cheng Sun; David B. Bogy; Xiang Zhang
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Paper Abstract

Optical lithography has been the key for continuous size reduction of semiconductor devices and circuits manufacturing. Although the industry is continually improving the resolution, optical lithography becomes more difficult and less cost effective in satisfying the ever increasing demands in nano-manufacturing. Besides manufacturing, the dramatic advancements in nanoscale science and engineering also call an urgent need for high-throughput nano-fabrication technologies that are versatile to frequent design changes. Here we experimentally demonstrated the capability of patterning with 50 nm linewidth with a high flying speed at 10 meter/second. This low-cost nano-fabrication scheme has the potential of a few orders of magnitude higher throughput than current maskless techniques, and promises a new route towards the next generation nano-manufacturing. Besides its application in nanolithography, this technique can also be used for nanoscale metrology, imaging and data storage.

Paper Details

Date Published: 3 April 2010
PDF: 6 pages
Proc. SPIE 7637, Alternative Lithographic Technologies II, 763713 (3 April 2010); doi: 10.1117/12.848370
Show Author Affiliations
Liang Pan, Univ. of California, Berkeley (United States)
Yong-Shik Park, Univ. of California, Berkeley (United States)
Yi Xiong, Univ. of California, Berkeley (United States)
Erick Ulin-Avila, Univ. of California, Berkeley (United States)
Li Zeng, Univ. of California, Berkeley (United States)
Cheng Sun, Univ. of California, Berkeley (United States)
Northwestern Univ. (United States)
David B. Bogy, Univ. of California, Berkeley (United States)
Xiang Zhang, Univ. of California, Berkeley (United States)


Published in SPIE Proceedings Vol. 7637:
Alternative Lithographic Technologies II
Daniel J. C. Herr, Editor(s)

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