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Proceedings Paper

High volume manufacturing of nanoimprint lithography produced devices: addressing the stamp supply challenge
Author(s): Ye Zhou; Mohamed Asbahi; Gang Luo; Torbjörn Eriksson; Shoko Yamada; Prasanna Venkatesh Krishnan; Babak Heidari
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Paper Abstract

In order to realize industrial level manufacturing using Nano Imprint Lithography, one of the key challenges is to supply stamps for the high volume machines. The master stamp is typically time consuming to produce and thus very expensive. It is therefore preferable to produce the maximum amount of replicated stamp from a master and to ensure that each stamp replica can deliver as many imprints as possible without losing yield. Currently, stamp replication is an area of intense development. How to produce a replicated a stamp and how many replicas that can be achieved from each master depend both on feature sizes, pattern density as well as aspect ratio of the structures. Several different techniques can be combined in order to obtain a large number of stamp replicas from each master. The ability to combine several different techniques enables the choice of the ideal technique suited for each structure type. This paper will focus on how to address stamp replication challenges in order to secure an adequate supply of stamps to enable high volume manufacturing with Nano Imprint Lithography. Results will be presented on the number of stamps that can be manufactured from each master as well as the lifetime of each individual stamp.

Paper Details

Date Published: 3 April 2010
PDF: 9 pages
Proc. SPIE 7637, Alternative Lithographic Technologies II, 76371X (3 April 2010); doi: 10.1117/12.848332
Show Author Affiliations
Ye Zhou, OBDUCAT AB (Sweden)
Mohamed Asbahi, OBDUCAT AB (Sweden)
Gang Luo, OBDUCAT AB (Sweden)
Torbjörn Eriksson, OBDUCAT AB (Sweden)
Shoko Yamada, OBDUCAT AB (Sweden)
Prasanna Venkatesh Krishnan, OBDUCAT AB (Sweden)
Babak Heidari, OBDUCAT AB (Sweden)

Published in SPIE Proceedings Vol. 7637:
Alternative Lithographic Technologies II
Daniel J. C. Herr, Editor(s)

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