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Proceedings Paper

Simulation on resist-filling process in UV-nanoimprint lithography
Author(s): Yoshihiko Hirai; Hiroshi Hiroshima; Yoshinori Nagaoka
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Paper Details

Date Published:
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Proc. SPIE 7639, Advances in Resist Materials and Processing Technology XXVII, 76392J; doi: 10.1117/12.848321
Show Author Affiliations
Yoshihiko Hirai, Osaka Prefecture Univ. (Japan)
Hiroshi Hiroshima, National Institute of Advanced Industrial Science and Technology (Japan)
Yoshinori Nagaoka, Osaka Prefecture Univ. (Japan)


Published in SPIE Proceedings Vol. 7639:
Advances in Resist Materials and Processing Technology XXVII
Robert D. Allen, Editor(s)

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