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Proceedings Paper

Comparison of OPC models with and without 3D-mask effect
Author(s): Jung-Hoon Ser; Tae-Hoon Park; Moon-Gyu Jeong; Eun-Mi Lee; Sung-Woo Lee; Chun-Suk Suh; Seong-Woon Choi; Chan-Hoon Park; Joo-Tae Moon
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Paper Abstract

OPC models with and without thick mask effect (3D-mask effect) are compared in their prediction capabilities of actual 2D patterns. We give some examples in which thin-mask models fail to compensate the 3D-mask effect. The models without 3D-mask effect show good model residual error, but fail to predict some critical CD tendencies. Rigorous simulation predicts the observed CD tendencies, which confirms that the discrepancy really comes from 3D-mask effect.

Paper Details

Date Published: 22 March 2010
PDF: 6 pages
Proc. SPIE 7640, Optical Microlithography XXIII, 76401T (22 March 2010); doi: 10.1117/12.848317
Show Author Affiliations
Jung-Hoon Ser, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Tae-Hoon Park, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Moon-Gyu Jeong, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Eun-Mi Lee, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Sung-Woo Lee, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Chun-Suk Suh, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Seong-Woon Choi, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Chan-Hoon Park, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Joo-Tae Moon, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)


Published in SPIE Proceedings Vol. 7640:
Optical Microlithography XXIII
Mircea V. Dusa; Will Conley, Editor(s)

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