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Proceedings Paper

Simulation-based pattern matching using scanner metrology and design data to reduce reliance on CD metrology
Author(s): Yuan He; Erik Byers; Scott Light; Danielle Hines; Anton Devilliers; Mike Hyatt; Jianming Zhou; Vinay Nair; Zongchang Yu; Yu Cao; Xu Xie; Wenjin Shao; Rafael Aldana; Ronald Goossens; Chang-Qun Ma; Junwei Lu; Hua-yu Liu; Chris Aquino; Peter Engblom; Tjitte Nooitgedagt; Eric Janda
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Paper Abstract

Scanner matching based on wafer data has proven to be successful in the past years, but its adoption into production has been hampered by the significant time and cost overhead involved in obtaining large amounts of statistically precise wafer CD data. In this work, we explore the possibility of optical model based scanner matching that maximizes the use of scanner metrology and design data and minimizes the reliance on wafer CD metrology. A case study was conducted to match an ASML ArF immersion scanner to an ArF dry scanner for a 6Xnm technology node. We used the traditional, resist model based matching method calibrated with extensive wafer CD measurements and derived a baseline scanner manipulator adjustment recipe. We then compared this baseline scanner-matching recipe to two other recipes that were obtained from the new, optical model based matching method. In the following sections, we describe the implementation of both methods, provide their predicted and actual improvements after matching, and compare the ratio of performance to the workload of the methods. The paper concludes with a set of recommendations on the relative merits of each method for a variety of use cases.

Paper Details

Date Published: 4 March 2010
PDF: 10 pages
Proc. SPIE 7640, Optical Microlithography XXIII, 764014 (4 March 2010); doi: 10.1117/12.848255
Show Author Affiliations
Yuan He, Micron Technology, Inc. (United States)
Erik Byers, Micron Technology, Inc. (United States)
Scott Light, Micron Technology, Inc. (United States)
Danielle Hines, Micron Technology, Inc. (United States)
Anton Devilliers, Micron Technology, Inc. (United States)
Mike Hyatt, Micron Technology, Inc. (United States)
Jianming Zhou, Micron Technology, Inc. (United States)
Vinay Nair, Micron Technology, Inc. (United States)
Zongchang Yu, Brion Technologies, Inc. (United States)
Yu Cao, Brion Technologies, Inc. (United States)
Xu Xie, Brion Technologies, Inc. (United States)
Wenjin Shao, Brion Technologies, Inc. (United States)
Rafael Aldana, Brion Technologies, Inc. (United States)
Ronald Goossens, Brion Technologies, Inc. (United States)
Chang-Qun Ma, Brion Technologies, Inc. (United States)
Junwei Lu, Brion Technologies, Inc. (United States)
Hua-yu Liu, Brion Technologies, Inc. (United States)
Chris Aquino, Brion Technologies, Inc. (United States)
Peter Engblom, ASML (United States)
Tjitte Nooitgedagt, ASML (United States)
Eric Janda, ASML (United States)


Published in SPIE Proceedings Vol. 7640:
Optical Microlithography XXIII
Mircea V. Dusa; Will Conley, Editor(s)

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