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Proceedings Paper

Toward a consistent and accurate approach to modeling projection optics
Author(s): Danping Peng; Peter Hu; Vikram Tolani; Thuc Dam; Jacek Tyminski; Steve Slonaker
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Paper Abstract

This paper presents a consistent and modularized approach to modeling projection optics. Vector nature of light and polarization effect are considered from the very beginning at source, through mask and projection lens down into film stack. High-NA and immersion effect are also included. Of particular interest is the formulation of a modularized framework for computing optical images that allows various mask models (a thin-mask model, an empirical approximate mask model, or a rigorous mask 3D solver) to be used. We demonstrate that under Kirchoff thin-mask assumption our formulation is the same as Smythe formula. A compact film-stack model is formulated. The formulation is first presented in Abbe's source integration approach and then reformulated in Hopkins' TCC approach which allows for a SVD decomposition, which is computationally more efficient for a fixed optical setting.

Paper Details

Date Published: 11 March 2010
PDF: 9 pages
Proc. SPIE 7640, Optical Microlithography XXIII, 76402Y (11 March 2010); doi: 10.1117/12.848252
Show Author Affiliations
Danping Peng, Luminescent Technologies (United States)
Peter Hu, Luminescent Technologies (United States)
Vikram Tolani, Luminescent Technologies (United States)
Thuc Dam, Luminescent Technologies (United States)
Jacek Tyminski, Nikon Precision Inc. (United States)
Steve Slonaker, Nikon Precision Inc. (United States)


Published in SPIE Proceedings Vol. 7640:
Optical Microlithography XXIII
Mircea V. Dusa; Will Conley, Editor(s)

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