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Proceedings Paper

Multi-technique study of carbon contamination and cleaning of Mo/Si mirrors exposed to pulsed EUV radiation
Author(s): Mark Schürmann; Sergiy Yulin; Viatcheslav Nesterenko; Torsten Feigl; Norbert Kaiser; Boris Tkachenko; Max C. Schürmann
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Paper Abstract

Comparative lifetime studies of Mo/Si multilayer mirrors have been conducted at the Exposure Test Stand (ETS) using a pulsed Xe-discharge EUV source at XTREME Technologies GmbH (Göttingen, Germany). Due to the large, homogeneous exposed sample area a multi-technique study of EUV induced carbon contamination and cleaning can be conducted using standard surface science techniques. EUV-reflectometry, X-ray photoelectron spectroscopy (XPS), small-angle X-ray reflectometry (SAXR), and Out-of-band (OOB) reflectometry (200 - 1000 nm) were applied to investigate exposed samples and study EUV-induced changes of the surface composition. With this approach the influence of EUV-dose, cleaning-gas pressure and composition, and capping-layer material of the Mo/Si multilayer samples on the degradation and cleaning mechanism can be studied.

Paper Details

Date Published: 23 March 2010
PDF: 9 pages
Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 76361P (23 March 2010); doi: 10.1117/12.848197
Show Author Affiliations
Mark Schürmann, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Sergiy Yulin, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Viatcheslav Nesterenko, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Torsten Feigl, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Norbert Kaiser, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Boris Tkachenko, XTREME technologies GmbH (Germany)
Max C. Schürmann, XTREME technologies GmbH (Germany)


Published in SPIE Proceedings Vol. 7636:
Extreme Ultraviolet (EUV) Lithography
Bruno M. La Fontaine, Editor(s)

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