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Proceedings Paper

Optimization from design rules, source and mask, to full chip with a single computational lithography framework: level-set-methods-based inverse lithography technology (ILT)
Author(s): Linyong Pang; Danping Peng; Peter Hu; Dongxue Chen; Tom Cecil; Lin He; Guangming Xiao; Vikram Tolani; Thuc Dam; Ki-Ho Baik; Bob Gleason
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Paper Abstract

For semiconductor manufacturers moving toward advanced technology nodes -32nm, 22nm and below - lithography presents a great challenge, because it is fundamentally constrained by basic principles of optical physics. Because no major lithography hardware improvements are expected over the next couple years, Computational Lithography has been recognized by the industry as the key technology needed to drive lithographic performance. This implies not only simultaneous co-optimization of all the lithographic enhancement tricks that have been learned over the years, but that they also be pushed to the limit by powerful computational techniques and systems. In this paper a single computational lithography framework for design, mask, and source co-optimization will be explained in non-mathematical language. A number of memory and logic device results at the 32nm node and below are presented to demonstrate the benefits of Level-Set-Method-based ILT in applications covering design rule optimization, SMO, and full-chip correction.

Paper Details

Date Published: 10 March 2010
PDF: 21 pages
Proc. SPIE 7640, Optical Microlithography XXIII, 76400O (10 March 2010); doi: 10.1117/12.848145
Show Author Affiliations
Linyong Pang, Luminescent Technologies, Inc. (United States)
Danping Peng, Luminescent Technologies, Inc. (United States)
Peter Hu, Luminescent Technologies, Inc. (United States)
Dongxue Chen, Luminescent Technologies, Inc. (United States)
Tom Cecil, Luminescent Technologies, Inc. (United States)
Lin He, Luminescent Technologies, Inc. (United States)
Guangming Xiao, Luminescent Technologies, Inc. (United States)
Vikram Tolani, Luminescent Technologies, Inc. (United States)
Thuc Dam, Luminescent Technologies, Inc. (United States)
Ki-Ho Baik, Luminescent Technologies, Inc. (United States)
Bob Gleason, Luminescent Technologies, Inc. (United States)


Published in SPIE Proceedings Vol. 7640:
Optical Microlithography XXIII
Mircea V. Dusa; Will Conley, Editor(s)

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