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Proceedings Paper

In-situ monitoring and control of photoresist parameters during thermal processing in the lithography sequence
Author(s): Xiaodong Wu; Geng Yang; Ee-Xuan Lim; Arthur Tay
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Paper Abstract

The rapid transition to smaller microelectronic feature sizes involves the introduction of new lithography technologies, new photoresist materials, and tighter processes specifications. This transition has become increasingly difficult and costly. The application of advanced computational and control methodologies have seen increasing utilization in recent years to improve yields, throughput, and, in some cases, to enable the actual process to print smaller devices. In this work, we demonstrate recent advances in real-time monitoring and control of these photoresist parameters with the use of innovative technologies, control and signal processing techniques; and integrated metrology to improve the performance of the various photoresist processing steps in the lithography sequence.

Paper Details

Date Published: 14 December 2009
PDF: 11 pages
Proc. SPIE 7520, Lithography Asia 2009, 752035 (14 December 2009); doi: 10.1117/12.847879
Show Author Affiliations
Xiaodong Wu, National Univ. of Singapore (Singapore)
Geng Yang, National Univ. of Singapore (Singapore)
Ee-Xuan Lim, National Univ. of Singapore (Singapore)
Arthur Tay, National Univ. of Singapore (Singapore)


Published in SPIE Proceedings Vol. 7520:
Lithography Asia 2009
Alek C. Chen; Woo-Sung Han; Burn J. Lin; Anthony Yen, Editor(s)

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