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Proceedings Paper

Direct write 3-dimensional nanopatterning using probes
Author(s): David Pires; Armin Knoll; Urs Duerig; Ute Drechsler; Michel Despont; Heiko Wolf; James Hedrick; Ekmini de Silva
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Paper Abstract

A high-resolution probe based patterning method is presented using organic resists that respond to the presence of a hot tip by local material desorption. Thereby arbitrarily shaped patterns can be written in the organic films in the form of a topographic relief. The patterning process is highly reproducible and repeatable enabling the creation complex relief structures with arbitrary texture also in the vertical dimension. The patterns can be readily transferred into silicon using standard RIE technology. The new technique offers a cost-effective and competitive alternative to high-resolution electron-beam lithography in terms of both resolution and speed.

Paper Details

Date Published: 3 April 2010
PDF: 7 pages
Proc. SPIE 7637, Alternative Lithographic Technologies II, 76371E (3 April 2010); doi: 10.1117/12.847290
Show Author Affiliations
David Pires, IBM Zurich Research Lab. (Switzerland)
Armin Knoll, IBM Zurich Research Lab. (Switzerland)
Urs Duerig, IBM Zurich Research Lab. (Switzerland)
Ute Drechsler, IBM Zurich Research Lab. (Switzerland)
Michel Despont, IBM Zurich Research Lab. (Switzerland)
Heiko Wolf, IBM Zurich Research Lab. (Switzerland)
James Hedrick, IBM Almaden Research Ctr. (United States)
Ekmini de Silva, IBM Thomas J. Watson Research Ctr. (United States)

Published in SPIE Proceedings Vol. 7637:
Alternative Lithographic Technologies II
Daniel J. C. Herr, Editor(s)

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