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Proceedings Paper

Generation of arbitrary freeform source shapes using advanced illumination systems in high-NA immersion scanners
Author(s): Jörg Zimmermann; Paul Gräupner; Jens Timo Neumann; Dirk Hellweg; Dirk Jürgens; Michael Patra; Christoph Hennerkes; Manfred Maul; Bernd Geh; Andre Engelen; Oscar Noordman; Melchior Mulder; Sean Park; Joep De Vocht
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Paper Abstract

The application of customized and freeform illumination source shapes is a key enabler for continued shrink using 193 nm water based immersion lithography at the maximum possible NA of 1.35. In this paper we present the capabilities of the DOE based Aerial XP illuminator and the new programmable FlexRay illuminator. Both of these advanced illumination systems support the generation of such arbitrarily shaped illumination sources. We explain how the different parts of the optical column interact in forming the source shape with which the reticle is illuminated. Practical constraints of the systems do not limit the capabilities to utilize the benefit of freeform source shapes vs. classic pupil shapes. Despite a different pupil forming mechanism in the two illuminator types, the resulting pupils are compatible regarding lithographic imaging performance so that processes can be transferred between the two illuminator types. Measured freeform sources can be characterized by applying a parametric fit model, to extract information for optimum pupil setup, and by importing the measured source bitmap into an imaging simulator to directly evaluate its impact on CD and overlay. We compare measured freeform sources from both illuminator types and demonstrate the good matching between measured FlexRay and DOE based freeform source shapes.

Paper Details

Date Published: 3 March 2010
PDF: 15 pages
Proc. SPIE 7640, Optical Microlithography XXIII, 764005 (3 March 2010); doi: 10.1117/12.847282
Show Author Affiliations
Jörg Zimmermann, Carl Zeiss SMT AG (Germany)
Paul Gräupner, Carl Zeiss SMT AG (Germany)
Jens Timo Neumann, Carl Zeiss SMT AG (Germany)
Dirk Hellweg, Carl Zeiss SMT AG (Germany)
Dirk Jürgens, Carl Zeiss SMT AG (Germany)
Michael Patra, Carl Zeiss SMT AG (Germany)
Christoph Hennerkes, Carl Zeiss SMT AG (Germany)
Manfred Maul, Carl Zeiss SMT AG (Germany)
Bernd Geh, Carl Zeiss SMT AG (Germany)
ASML US, Inc. (United States)
Andre Engelen, ASML (Netherlands)
Oscar Noordman, ASML (Netherlands)
Melchior Mulder, ASML (Netherlands)
Sean Park, Brion Technologies, Inc. (United States)
Joep De Vocht, Brion Technologies, inc. (United States)


Published in SPIE Proceedings Vol. 7640:
Optical Microlithography XXIII
Mircea V. Dusa; Will Conley, Editor(s)

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