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Proceedings Paper

AMC control in photolithography: the past decade in review
Author(s): Gerald Weineck; Dustin Zastera; Andrew J. Dallas
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Paper Abstract

The focus of airborne molecular contamination (AMC) control within the semiconductor industry, specifically photolithography, has changed significantly over the past decade. As the focal point of concern has shifted from ammonia (or base gases), to acid gases, and recently to organic contaminants, the filtration industry has adeptly grown to provide the necessary filtration solutions. This paper attempts to provide an overview of these changes while reviewing the primary contaminants, how they are removed, the control technologies in use, and how they are applied.

Paper Details

Date Published: 2 April 2010
PDF: 9 pages
Proc. SPIE 7638, Metrology, Inspection, and Process Control for Microlithography XXIV, 76383H (2 April 2010); doi: 10.1117/12.847258
Show Author Affiliations
Gerald Weineck, Donaldson Co., Inc. (United States)
Dustin Zastera, Donaldson Co., Inc. (United States)
Andrew J. Dallas, Donaldson Co., Inc. (United States)

Published in SPIE Proceedings Vol. 7638:
Metrology, Inspection, and Process Control for Microlithography XXIV
Christopher J. Raymond, Editor(s)

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