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Proceedings Paper

Wavelength dependence of carbon contamination on mirrors with different capping layers
Author(s): Petros Thomas; Leonid Yankulin; Yashdeep Khopkar; Rashi Garg; Chimaobi Mbanaso; Alin Antohe; Yu-Jen Fan; Gregory Denbeaux; Samir Aouadi; Vibhu Jindal; Andrea Wüest
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Paper Abstract

Optics contamination remains one of the challenges in extreme ultraviolet (EUV) lithography. In addition to the desired wavelength near 13.5 nm (EUV), plasma sources used in EUV exposure tools emit a wide range of out-of-band (OOB) wavelengths extending as far as the visible region. We present experimental results of contamination rates of EUV and OOB light using a Xe plasma source and filters. Employing heated carbon tape as a source of hydrocarbons, we have measured the wavelength dependence of carbon contamination on a Ru-capped mirror. These results are compared to contamination rates on TiO2 and ZrO2 capping layers.

Paper Details

Date Published: 22 March 2010
PDF: 8 pages
Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 76361X (22 March 2010); doi: 10.1117/12.847015
Show Author Affiliations
Petros Thomas, Univ. at Albany (United States)
Leonid Yankulin, Univ. at Albany (United States)
Yashdeep Khopkar, Univ. at Albany (United States)
Rashi Garg, Univ. at Albany (United States)
Chimaobi Mbanaso, Univ. at Albany (United States)
Alin Antohe, Univ. at Albany (United States)
Yu-Jen Fan, Univ. at Albany (United States)
Gregory Denbeaux, Univ. at Albany (United States)
Samir Aouadi, Southern Illinois Univ. at Carbondale (United States)
Vibhu Jindal, SEMATECH North (United States)
Andrea Wüest, SEMATECH North (United States)


Published in SPIE Proceedings Vol. 7636:
Extreme Ultraviolet (EUV) Lithography
Bruno M. La Fontaine, Editor(s)

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