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Proceedings Paper

Path-integral analysis of the reflective extreme-ultraviolet photon from Si surface
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Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, ; doi: 10.1117/12.847002
Show Author Affiliations
Ting-Hang Pei, National Taiwan Univ. (Taiwan)
Kuen-Yu Tsai, National Taiwan Univ. (Taiwan)
Jia-Han Li, National Taiwan Univ. (Taiwan)


Published in SPIE Proceedings Vol. 7636:
Extreme Ultraviolet (EUV) Lithography
Bruno M. La Fontaine, Editor(s)

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