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Proceedings Paper

Reaction kinetics of non-reciprocal photo-base generator (NRPBG) patterning
Author(s): D. Shykind; R. Bristol; J. Roberts; J. Blackwell; Y. Borodovsky
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Paper Abstract

We present a simple reaction rate analysis of lithographic patterning using the Non-Reciprocal Photo Base Generation (NRPBG) scheme of Bristol (Bristol, et. al., to be published in Proceedings of the SPIE - The International Society for Optical Engineering, 2010, presentation 7639-4). Multistep reaction kinetics simulations demonstrate that the NRPBG scheme produces clear pitch division upon 193 nm double-exposure, over a range of photochemical reaction rate constants.

Paper Details

Date Published: 30 March 2010
PDF: 10 pages
Proc. SPIE 7639, Advances in Resist Materials and Processing Technology XXVII, 76391Y (30 March 2010); doi: 10.1117/12.846990
Show Author Affiliations
D. Shykind, Intel Corp. (United States)
R. Bristol, Intel Corp. (United States)
J. Roberts, Intel Corp. (United States)
J. Blackwell, Intel Corp. (United States)
Y. Borodovsky, Intel Corp. (United States)

Published in SPIE Proceedings Vol. 7639:
Advances in Resist Materials and Processing Technology XXVII
Robert D. Allen, Editor(s)

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