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Proceedings Paper

Dynamics of radical cation of poly(4-hydroxystyrene) generated in thin film upon exposure to electron beam
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Paper Abstract

In chemically amplified resists for extreme ultraviolet (EUV) and electron beam (EB) lithographies, the reaction mechanism of acid generation is different from that for photolithography. However, details of acid generation are still unclear. In particularly, details of the deprotonation dynamics of radical cations in solid resist films have not been investigated. The dynamics of radical cations of resist polymer is important for understanding proton generation. Poly(4-hydroxystyrene) (PHS) is a typical polymer for EUV and EB lithographies. We observed the dynamics of PHS radical cation in PHS film by using pulse radiolysis.

Paper Details

Date Published: 29 March 2010
PDF: 9 pages
Proc. SPIE 7639, Advances in Resist Materials and Processing Technology XXVII, 76391K (29 March 2010); doi: 10.1117/12.846699
Show Author Affiliations
Kenichiro Natsuda, Osaka Univ. (Japan)
Takahiro Kozawa, Osaka Univ. (Japan)
Kazumasa Okamoto, Osaka Univ. (Japan)
Akinori Saeki, Osaka Univ. (Japan)
Seiichi Tagawa, Osaka Univ. (Japan)


Published in SPIE Proceedings Vol. 7639:
Advances in Resist Materials and Processing Technology XXVII
Robert D. Allen, Editor(s)

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