Share Email Print
cover

Proceedings Paper

Pattern-based OPC acceleration for performance and cost saving in mask synthesis flow
Author(s): Joanne Wu; Walter Chan; Gary Zhang; Guojie Chen; Yue Ma
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Details

Date Published:
PDF
Proc. SPIE 7641, Design for Manufacturability through Design-Process Integration IV, 76410Z; doi: 10.1117/12.846675
Show Author Affiliations
Joanne Wu, Anchor Semiconductor, Inc. (United States)
Walter Chan, Anchor Semiconductor, Inc. (United States)
Gary Zhang, Anchor Semiconductor, Inc. (United States)
Guojie Chen, Anchor Semiconductor, Inc. (United States)
Yue Ma, Anchor Semiconductor, Inc. (United States)


Published in SPIE Proceedings Vol. 7641:
Design for Manufacturability through Design-Process Integration IV
Michael L. Rieger; Joerg Thiele, Editor(s)

© SPIE. Terms of Use
Back to Top