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Proceedings Paper

Application of automated topography focus corrections for volume manufacturing
Author(s): Timothy J. Wiltshire; Bernhard R. Liegl; Emily M. Hwang; Mark R. Lucksinger
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Paper Abstract

This work describes the implementation and performance of AGILE focus corrections for advanced photo lithography in volume production as well as advanced development in IBM's 300mm facility. In particular, a logic hierarchy that manages the air gage sub-system corrections to optimize tool productivity while sampling with sufficient frequency to ensure focus accuracy for stable production processes is described. The information reviewed includes: General AGILE implementation approaches; Sample focus correction contours for critical 45nm, 32nm, and 22nm applications; An outline of the IBM Advanced Process Control (APC) logic and system(s) that manage the focus correction sets; Long term, historical focus correction data for stable 45nm processes as well as development stage 32nm processes; Practical issues encountered and possible enhancements to the methodology.

Paper Details

Date Published: 1 April 2010
PDF: 9 pages
Proc. SPIE 7638, Metrology, Inspection, and Process Control for Microlithography XXIV, 76380F (1 April 2010); doi: 10.1117/12.846652
Show Author Affiliations
Timothy J. Wiltshire, IBM Corp. (United States)
Bernhard R. Liegl, IBM Corp. (United States)
Emily M. Hwang, IBM Corp. (United States)
Mark R. Lucksinger, IBM Corp. (United States)


Published in SPIE Proceedings Vol. 7638:
Metrology, Inspection, and Process Control for Microlithography XXIV
Christopher J. Raymond, Editor(s)

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