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Proceedings Paper

A GPU-based full-chip source-mask optimization solution
Author(s): Ilhami Torunoglu; Erich Elsen; Ahmet Karakas
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Paper Abstract

A simultaneous optimization of source and mask with full-chip capability is presented. To provide full-chip processing capability, the solution is intentionally based on GPUs as well as CPUs and made scalable to large clusters while maintaining convergence. The approach uses a proprietary search algorithm to converge to an optimal solution in the sense of print quality maximization while obeying existing mask manufacturing, lithography equipment and process technology constraints. The solution is based on a proprietary optimization function that is applicable to both binary and phase shift masks.

Paper Details

Date Published: 4 March 2010
PDF: 10 pages
Proc. SPIE 7640, Optical Microlithography XXIII, 76401L (4 March 2010); doi: 10.1117/12.846640
Show Author Affiliations
Ilhami Torunoglu, Gauda Inc. (United States)
Erich Elsen, Gauda Inc. (United States)
Ahmet Karakas, Gauda Inc. (United States)


Published in SPIE Proceedings Vol. 7640:
Optical Microlithography XXIII
Mircea V. Dusa; Will Conley, Editor(s)

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