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Proceedings Paper

Tolerancing analysis of customized illumination for practical applications of source and mask optimization
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Paper Abstract

Due to the extremely small process window in the 32nm feature generation and beyond, it is necessary to implement active techniques that can expand the process window and robustness of the imaging against various kinds of imaging parameters. Source & Mask Optimization (SMO) 1 is a promising candidate for such techniques. Although many applications of SMO are expected, tolerancing and specifications for aggressively customized illuminators have not been discussed yet. In this paper we are going to study tolerancing of a freeform pupilgram which is a solution of SMO. We propose Zernike intensity/distortion modulation method to express pupilgram errors. This method may be effective for tolerancing analysis and defining the specifications for freeform illumination. Furthermore, this method is can be applied to OPE matching of free form illumination source.

Paper Details

Date Published: 4 March 2010
PDF: 10 pages
Proc. SPIE 7640, Optical Microlithography XXIII, 764007 (4 March 2010); doi: 10.1117/12.846639
Show Author Affiliations
Tomoyuki Matsuyama, Nikon Corp. (Japan)
Naonori Kita, Nikon Corp. (Japan)
Toshiharu Nakashima, Nikon Corp. (Japan)
Osamu Tanitsu, Nikon Corp. (Japan)
Soichi Owa, Nikon Corp. (Japan)


Published in SPIE Proceedings Vol. 7640:
Optical Microlithography XXIII
Mircea V. Dusa; Will Conley, Editor(s)

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