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Proceedings Paper

A GPU-based full-chip inverse lithography solution for random patterns
Author(s): Ilhami Torunoglu; Ahmet Karakas; Erich Elsen; Curtis Andrus; Brandon Bremen; Boris Dimitrov; Jeffrey Ungar
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Paper Abstract

An inverse lithography solution based on optimization is presented. The optimization approach, in effect, operates as an inverse lithography tool, based on modeling and simulation of the manufacturing process. Given the associated computational requirements, the proposed solution intentionally uses graphic processors (GPUs) as well as CPUs as computation hardware. Due to the approach we employed, the results are optimized towards manufacturability and process window maximization.

Paper Details

Date Published: 2 April 2010
PDF: 8 pages
Proc. SPIE 7641, Design for Manufacturability through Design-Process Integration IV, 764115 (2 April 2010); doi: 10.1117/12.846638
Show Author Affiliations
Ilhami Torunoglu, Gauda Inc. (United States)
Ahmet Karakas, Gauda Inc. (United States)
Erich Elsen, Gauda Inc. (United States)
Curtis Andrus, Gauda Inc. (United States)
Brandon Bremen, Gauda Inc. (United States)
Boris Dimitrov, Gauda Inc. (United States)
Jeffrey Ungar, Gauda Inc. (United States)

Published in SPIE Proceedings Vol. 7641:
Design for Manufacturability through Design-Process Integration IV
Michael L. Rieger; Joerg Thiele, Editor(s)

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