Share Email Print
cover

Proceedings Paper

Cobalt-containing polymers as patterning assist layers in extreme ultraviolet lithography
Author(s): Georgeta Masson
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

This paper communicates the use of cobalt-containing polymers in extreme ultra-violet lithography (EUVL). The polymers were synthesized in a two-step process through the complexation of dicobalt octacarbonyl, Co2(CO)8 to a mainchain alkyne-functional polyester obtained by polycondensation protocol. As indicated by thermal analysis, the cobaltcontaining polymers are characterized by a thermal transition around 110 °C assigned to a crosslinking process, a key factor in considering these materials as candidates for patterning assist layers (PAL) in EUVL. Positive and negative impacts of the metal component introduced through PAL upon the resolution, line-width roughness (LWR), and sensitivity (RLS) of the resist were investigated. The potential utility of these materials as wet developable PAL is also described.

Paper Details

Date Published: 22 March 2010
PDF: 10 pages
Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 763631 (22 March 2010); doi: 10.1117/12.846634
Show Author Affiliations
Georgeta Masson, Lawrence Berkeley National Lab. (United States)


Published in SPIE Proceedings Vol. 7636:
Extreme Ultraviolet (EUV) Lithography
Bruno M. La Fontaine, Editor(s)

© SPIE. Terms of Use
Back to Top