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Proceedings Paper

Advances in DOE modeling and optical performance for SMO applications
Author(s): James Carriere; Jared Stack; John Childers; Kevin Welch; Marc D. Himel
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Paper Abstract

The introduction of source mask optimization (SMO) to the design process addresses an urgent need for the 32nm node and beyond as alternative lithography approaches continue to push out. To take full advantage of SMO routines, an understanding of the characteristic properties of diffractive optical elements (DOEs) is required. Greater flexibility in the DOE output is needed to optimize lithographic process windows. In addition, new and tighter constraints on the DOEs used for off-axis illumination (OAI) are being introduced to precisely predict, control and reduce the effects of pole imbalance and stray light on the CD budget. We present recent advancements in the modeling and optical performance of these DOEs.

Paper Details

Date Published: 3 March 2010
PDF: 9 pages
Proc. SPIE 7640, Optical Microlithography XXIII, 764025 (3 March 2010); doi: 10.1117/12.846619
Show Author Affiliations
James Carriere, Tessera (United States)
Jared Stack, Tessera (United States)
John Childers, Tessera (United States)
Kevin Welch, Tessera (United States)
Marc D. Himel, Tessera (United States)

Published in SPIE Proceedings Vol. 7640:
Optical Microlithography XXIII
Mircea V. Dusa; Will Conley, Editor(s)

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