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Proceedings Paper

Step and flash imprint lithography for semiconductor high volume manufacturing?
Author(s): M. Malloy; L. C. Litt
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Paper Abstract

Step and Flash Imprint Lithography (SFIL), a form of ultraviolet nanoimprint lithography (UV-NIL), is recognized for its resolution and patterning abilities. It is one of the few next generation lithography techniques capable of meeting the resolution requirements of future semiconductor devices. However, many integration issues such as defectivity, throughput, and overlay must be resolved before SFIL can be used for semiconductor high volume manufacturing (HVM). This paper discusses the current status of SFIL, including the process and templates, and shows where more industry collaboration is needed to solve the most critical issues.

Paper Details

Date Published: 1 April 2010
PDF: 11 pages
Proc. SPIE 7637, Alternative Lithographic Technologies II, 763706 (1 April 2010); doi: 10.1117/12.846617
Show Author Affiliations
M. Malloy, SEMATECH (United States)
L. C. Litt, SEMATECH (United States)


Published in SPIE Proceedings Vol. 7637:
Alternative Lithographic Technologies II
Daniel J. C. Herr, Editor(s)

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